MPI TS200-SE Manual de usuario

MPI TS200-SE

200 mm Manual Probe System

User Manual

IMPORTANT NOTICE OF USE

PREFACE

SAFETY NOTICE

manual may not be copied or modied in whole or part, without the written consent

of the publisher.

2. Parts of this manual are subject to change without prior notice.

3. We welcome any comments on ambiguities, errors, omissions, or missing pages.

4. Never attempt any procedure on the MPI TS200-SE probe system that is not specially

described in this manual. Unauthorized operation can cause faults or accidents. MPI

Corporation is not liable for any problems resulting from unauthorized operation of the

equipment.

In this manual, safety instructions are preceded by the symbol . Always read and fol-

low the instructions before performing the required procedures. Informational notes are

preceded by the symbol . It indicates important information about the product.

Thank you for purchasing the TS200-SE probe system. This user manual is intended for

users who are using the probe system for the first time. It provides all necessary informati-

on about the overview, unpacking and installation procedures, operation and maintenance

of the system.

The information in this manual will help users to have a safer and more efficient operation

of the probe system. Any nonconformity from the proposed operation or any modification

of use which the probe system is not intended may results in a hazardous and not efficient

operation scenario or situation. MPI Corporation renounces any claim of responsibilities for

any consequences resulting from any alteration and nonconformity from intended use of

the system.

Please consult our MPI technical support team or our service representative if you are un-

sure of using the equipment.

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

CAUTION! : Electronic Shock! Danger of Operation!

Do not touch during operation. Danger of electric shock or burn. Switch or turn off electrical

power before accessing part

CAUTION! : Hot Surface! Danger of burning!

Do not touch during operation. Allow it to cool to ambient temperature (19°C to 24°C) before

coming to contact with surface.

CAUTION! : Cold surface! Danger of freezing!

Do not touch during operation. Allow it to warm up to ambient temperature (19°C to 24°C)

before coming to contact with surface.

CAUTIOUS! : Moving Parts! Danger of injury!

Do not touch during operation.

CAUTIOUS! : Laser Radiation! Avoid direct eye exposure!

Do not stare into beam. Wear eye protection at all times.

For More Information

More information may be available from these sources:

• World Wide Web: mpi-corporation.com

The MPI Corporation website contains current information about the company and locations of sales offices,

new and existing products, contacts for sales, service and technical support information. You can also send

e-mail to MPI Corporation using the web site.*

• Other: If you purchased your MPI product from our distributors or representative, you can contact them for

service and support.

*When sending email for technical support, please provide information on both the hardware and soware, with a detailed description

of the problem.

SAFETY LABELS

The following labels may appear on your probe station depending on the application con-

figuration of your probe system. Read all safety instructions in this document and on the

probe system. Report any problems to a MPI Corporation service representative.

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

Content

Overview ��6

Probe System Architecture ��7

Microscope and Movement ..................................................................................................................7

Probe Platen ..........................................................................................................................................7

Wafer Chuck...........................................................................................................................................7

Chuck XYT Stage ....................................................................................................................................7

Base Platform ........................................................................................................................................7

MPI MicroPositioner ..............................................................................................................................7

Non Electrical Utilities...........................................................................................................................9

Electrical Utilities...................................................................................................................................9

Open Connections.................................................................................................................................9

Accessories.............................................................................................................................................9

Installation��10

Probe System Unpacking ....................................................................................................................10

Probe System - Transport Locks Removal..........................................................................................11

Microscope - Transport Locks Removal..............................................................................................11

Microscope Installation .......................................................................................................................12

System Facility Hookup.......................................................................................................................18

Operation��20

Chuck Stage .........................................................................................................................................20

Microscope Movement ........................................................................................................................22

Platen Adjustment and Control ..........................................................................................................27

System Vacuum Control......................................................................................................................28

MicroPositioner Setup and Control ....................................................................................................29

Maintenance and Service ��35

Mechanical Adjustments .....................................................................................................................35

Preventive Maintenance......................................................................................................................37

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

General Maintenance.................................................................................................................37

Troubleshooting ........................................................................................................................38

Service........................................................................................................................................39

Facility Requirements �� 40

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

Overview

The MPI TS200-ShieldEnvironment™ (TS200-SE) is designed to ensure advanced EMI/RFI/

light-tight shielding, ultra-low noise, low leakage measurement capabilities in a tempera-

ture range from -60 to +300°C.

TS200-SE Manual Probe System Front View with the Microscope

1. Microscope 2. Microscope movement

3. ShielDCap TM 4. ShielDEnvironment TM

5. Platen lift 6. Thermal Chuck Integration

7. Kelvin interface panel 8. Probe Platen

9. Chuck XYT stage 10. Vacuum Controls for Scope, Chuck and Aux

Chuck

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

Probe System Architecture

Base Platform

Chuck XYT Stage

Wafer Chuck

Probe Platen

Microscope and Movement

The base platform of the probe station is secured on four shock absorbing rubber feet.

The base plate is located in the center of the platform along with the microscope moun-

ting bridge at the back of the platform. Together, these elements provide a stable moun-

ting surface for the wafer stage, probe platen and microscope.

The chuck stage consists of X, Y and Theta movement of the wafer chuck. The wafer

chuck uses air bearing puck control for fast movement. The maximum stage travel in X

is 225 mm and in Y is 260 mm. The theta stage has a fine micrometer adjustment of ± 5.0°

in theta.

MPI TS200-SE probe system can be equipped with different wafer chuck configurations

to include RF chuck, mmW Chuck, auxiliary chucks and thermal chuck systems.

The platen is incorporated with a platen lift function which consists of 3 preset positions:

Lift (3mm from contact), Separation (300µm from contact) and Contact (0 µm from cont-

act). The probe platen can support up to 4 RF or 8 DC MicroPositioners

MPI TS200-SE microscope movement is mounted on top of the rigid microscope bridge.

The bridge supports both 5050/8080 ZUM movement and 5050ZUM-VM pneumatic Z mo-

vemnts with XY controlled knobs. Several microscope types are available and each has

its own separate adapter.

MPI MicroPositioner

MPI oers a wide variety of backlash-free MicroPositioners to address every operational and

measurement condition. These vary from small footprint to micrometer driven high resoluti-

on positioners for RF and mmW applications.

Unified Z-direction, ergonomic operation, and strong magnetic bases enable fine probe

placement for high contact quality producing unsurpassed measurement results. The

MPI MicroPositioners are designed with universal interface compatible to all probe arms

for ease of application specifics adaptations. Design varieties allow operators to choose

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

MicroPositioners which fit their operational familiarity thus providing immediately pro-

ficiency.

MPI unique MP80-DX with easy and precise definition down to 1μm - is the ideal choice

for accurate and cost-effective multiline TRL – the only RF calibration method in the

mmW and sub-THZ range.

The MPI self-developed MicroPositioners are designed without compromise. The full

carbon-steel structure enables stable contact over long periods of time and superior

positioning accuracy.

Probe Arms/

MicroPositioners Coax Coax

10kV Triax Triax

3kV Kelvin RF HC

Dedicated

mmW

MP25 -- - -

MP40

MP50

MP50-HR - -

MP60

MP60-HR -

MP60-MR -

MP80

MP80-DX - - - - - -

*= recommended = available = DC biasing

MP25

XYZ | 10 mm

Feature Resolution | < 4 μm

MP40

XYZ | 13 mm

Feature Resolution | < 2 μm

MP50

XYZ | 13 mm

Feature Resolution | < 1 μm

MP60 / MP60HR

XYZ | 13 mm

Feature Resolution | < 1 μm

MP60-MR

XYZ | 13 mm

Feature Resolution | < 1 μm

MP80

XYZ | 25 mm

Feature Resolution | < 2 μm

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

Open Connections

Accessories

MPI TS200-SE probe system can be equipped with a wide range of accessories and op-

tions; each with its own electrical interconnects. The supported plugs and connectors

are designed to prevent incorrect connections. Be cautious when connecting to other

components.

MPI TS200-SE can be congured with an extensive selection of accessories.

• Vibration Isolation Tables

• Test System Table with Integrated computer rack and keyboard tray

• Vacuum Pump

• Air Compressor

• Digital Camera and LCD/LED display screen

• Instrument Shelf

• Single or Dual Display Screen Stand

• Refer to MPI sales and distributor for more complete list of accessories compatible with

MPI TS200-SE probe system.

Non Electrical Utilities

MPI TS200-SE probe system requires compressed air and vacuum supply in order to

operate the probe system. Please connect the compressed air and vacuum supply to

the system. If the probe system comes with accessories that require compressed air,

nitrogen or vacuum, connect them as necessary.

One grounding point can be found at the rear base platform of the TS200-SE manual

probe system.

Electrical Utilities

MPI probe system may require power supply for the system accessories. For accessories

which require high power consumption such as a thermal chuck system and controller

should be plugged to the main power supply from the facilities supply of your location.

User Manual-MPI-TS200-SE-UG REV 1.1.0 -19122017

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