4
Jelight Company, Inc.
2 Mason
Irvine, CA 92618 U.S.A
el: +1(949) 380-8774 Fax +1(949) 768-9457
Introduction
he UV+O (atomic oxygen) cleaning method is a photosensitized oxidation process in which the
contaminant molecules of photo-resists, resins, human skin oils, cleaning solvent residues,
silicone oils, and flux are excited and/or dissociated by the absorption of short-wavelength UV
radiation. Atomic oxygen is simultaneously generated when molecular oxygen is dissociated by
184.9nm and ozone by 253.7nm.
253.7nm radiation is absorbed by most hydrocarbons and also by ozone. he products of this
excitation of contaminant molecules react with atomic oxygen to form simpler, volatile molecules
which desorb from the surface. herefore when both wavelengths are present, atomic oxygen is
continuously generated and ozone is continually formed and destroyed.
By placing properly pre-cleaned samples within five millimeters of ozone producing UV source,
such as the low pressure mercury vapor grid lamp inside the UVO-Cleaner
®
, near atomically
clean surfaces can be achieved in less than one minute. In addition, this process does not
damage any sensitive device structures of MOS gate oxide.
he UVO-Cleaner
®
is the safest and most effective method of removing organic contaminants
from silicon, gallium arsenide, quartz, sapphire, glass, mica, ceramics, metals, and conductive
polyimide cements. It is built to last with low maintenance and trouble free service.
Applications:
•
Substrate cleaning prior to thin film deposition/descumming and stabilizing photo-resist
•
Cleaning of silicon wafers, lenses, mirrors, solar panels, cold rolled steel, inertial guidance
subcomponents, and GaAs wafers
•
Cleaning of flux, hybrid circuits, and flat panel LCD
•
Etching eflon
®
, Viton
®
, and other organic materials
•
Enhancing oxide passivated surfaces of GaAs and Si
•
Reduce out-gassing of glass
•
Wafer tape removal
•
Improve adhesion of coatings on plastics
•
Ink removal from wafers after testing
•
Stripping photo-resist
•
Removing latent images from lithography plates
•
Cleaning lithography plates
•
Growing oxide layers on silicon wafers
•
Cleaning circuit boards prior to packaging/adhesion
•
Increase hydrophilic characteristics of surfaces
•
Cleaning and sterilization for bioscience applications
•
Cleaning electronic microscope probes/slides or optical fibers/lenses
•
Details of each application’s data/journal/article: www.jelight.com/applications.php
