G 01039 - Edition 08 - December 06
1/5
A 20
ADP/ADS Series Two dry pump range
The pump manufacturer has developed a range of dry pumps
adapted to the different processes used in the semi-conductor industry.
The range includes:
ADP122, which is available in two versions:
ADP 122 P: integrated in a covered frame including: the pump,
the monitoring, the hand-held remote control, facilities, the
flowmeter panel, the OEM interface, the serial link.
ADP 122 LM: simplified model with monitoring designed for clean
processes (load-lock and transfer chamber pumping).
Five pumping groups composed of an ADP122 combined with
a Roots to make a fully integrated system:
ADS 602 H, ADS 602 P, ADS 602 LM, ADS 1202 H and
ADS 1202 P for semi-conductors processes.
Two high volume pumping groups ADS 1802.
They are composed of a A300 primary dry pump with a
RSV 1802W Roots blower fitted to the inlet of the dry pump.
The A300 dry pump is a five stage Roots type pump similar to
ADP 122 pump, the RSV 1802W booster is a Roots blower type
pump similar to RSV 1002P blower used in ADS 1202 P system.
They are available in two versions:
ADS 1802 P for medium processes in the semi-conductor.
ADS 1802 H for harsh processes (anti-corrosive materials,
possibility to increase purge flowrate). It includes a built-in
dual cooling system.
H models are optimized for harsh processes (anti-corrosive materials,
possibility to increase purge flowrate). Beside they are equipped with
exhaust pipe heater device which reduces deposits when pumping
condensable gases.
Model’s description
Monitoring Purge Thermo-controlled Applications
ADP 122 LM - ADS 602 LM M4 No No Clean processes
ADP 122 P - ADS 602 P
ADS 1202 P - ADS 1802 P M4 Yes Yes Medium processes
ADS 602 H
ADS 1202 H - ADS 1802 H M4 Yes Yes Harsh processes
